WAFER

REACTOR

DryScrub^®

REACTOR

HYDRIDE GAS

COLLECTIONCAPACITY

(liters)

CONST. "C", (For Electrode Life Expectancy Calculation)

Processes

Input Gases

Waste Solids

Waste Gases

Nitride

Si₂H₂Cl + NH₃

Nitride + NH₄Cl

N₂ + H₂ + NH₃

600

9.2 × 10⁵

PSG

SiH₄ + PH₃ + O₂

PSG

O₂ + H₂O

1,800

4.2 × 10⁶

BPSG

SiH₄ + PH₃ + B₂H₆ + O₂

BPSG

O₂ + H₂O

1,800

4.2 × 10⁶

TEOS OXIDE

Si(OC₂H₅)₄ + O₂/O₃

OXIDE

O₂ + H₂O + CO₂ + Ethyl Group

1,700

1.7 × 10⁶

PECVD NITRIDE

SiH₄ + NH₃ + N₂O

NITRIDE

N₂ + H₂ + NH₃ + H₂O

1,800

2.7 × 10⁶

PECVD OXYNIT.

SiH₄ + NH₃ + N₂O

OXYNITRIDE

N₂ + H₂ + NH₃ + H₂O

1,800

2.7 × 10⁶

PECVD OXIDE

SiH₄ + N₂O

OXIDE

N₂ + O₂ + H₂O

1,800

1.7 × 10⁶

As/P/B Doped Poly

SiH₄ + AsH₃/PH₃/B₂H₆

As/P/B Doped Si

H₂

4,000

4.2 × 10⁶

Amorphous Si

SiH₄/Si₂H₆

Amorphous Si

H₂

4,000/2,000

4.2 × 10⁶

W Silicide

WF₆ + SiF₄ + H₂

SiW_x + Si(F)

H₂

3,800

1.0 × 10⁶