Electrochemical Technology CorporationDryScrub®

 

Process:
 

PECVD TEOS,
very long deposition process time

Quantity:

One

Pumps:

Dry, and Oil Sealed

DryScrub® Systems:

One

Reported Benefits Derived from DryScrub® Installations:

  1. Relative to dry pumps:
    1. frequent failures with pumps from various manufacturers, failed within 3 days to approximately 2 weeks, have been reduced to none in over 1 year.
    2. wafer load losses due to particle caused failures eliminated for over 1 year.
    3. exhaust side manifold maintenance, caused by particle accumulation, reduced from 3 week intervals to 3 months.
    4. purge gas consumption reduced.

 

  1. Relative to oil sealed pumps, and filtration systems:
    Note: An oil sealed pump was installed after repeated dry pump failures, and prior to DryScrub    ® System purchase. The DryScrub® unit was temporarily installed on the oil pumped system, while awaiting a replacement dry pump.
    1. no pump in-process failures experienced during an approximate 1 month test.
    2. PFPE oil filter maintenance reduced by a factor of 10.
    3. PFPE fluid losses significantly reduced to make-up oil lost as a function of filter change.
    4. pump related maintenance reduced from >40 hours per month, to
      5. <3 hours per month.>
    5. exhaust side manifold maintenance, caused by PFPE oil vapour and particle accumulation reduced.
    6. purge gas consumption, and gas velocity reduced, further reducing PFPE oil vapour loss.

 

  1. Process Benefits:
    1. process tool availability-uptime greatly improved.
    2. process reproducibility improved.
    3. particle related wafer load losses decreased.
    4. significant reduction of particle count on wafers.

 

  1. Other Benefits Related to DryScrub® Installations:
    1. predictability of, and reduced maintenance events have allowed re-direction of personnel to other fab requirements.
    2. treatment of undiluted deposition proccss effluent gases results in hazardous and/or toxic waste reduction, consequently reducing operating costs.
    3. personnel exposure to hazardous and/or toxic wastes is reduced.

 

  1. Return On Investment, Statement During Interview:
    1. relative to equipment related considerations, configured with a dry pump, ROI was achieved within a couple of months.
    2. ROI is achieved very quickly, relative to increased productivity; particularly, the reduction of one wafer load loss more than pays for DryScrub® System purchase, installation, as well as more than a year of operating costs.

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Tel: +1-408-DryScrub

(379-7278)

+1-510-818-9333

 

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(379-7278)

 

 

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