|
Process:
|
PECVD TEOS Nitride
|
|
Quantity:
|
One
|
|
Pumps:
|
Dry
|
|
DryScrub® Systems:
|
One
|
Reported Benefits Derived from DryScrub®
Installations:
- Relative to dry pumps:
- failures of both root blowers and dry pumps have been reduced to none in
over 2 years.
- exhaust side manifold maintenance, caused by particle accumulation,
reduced from 3 week intervals to 6 month intervals.
- purge gas consumption reduced.
- exhaust side manifold maintenance, caused by particle accumulation
reduced.
- Process Benefits:
- process tool availability-uptime greatly improved.
- process reproducibility improved.
- particle related wafer load losses decreased.
- significant reduction of particle count on wafers.
- Other Benefits Related to DryScrub® Installations:
- reaction and deposition of solids from SiH4
before the dry pump reduces formation of ammonium fluorosilicate
compounds in the exhaust manifold, thus reducing backpressure and
maintenance.
- predictability of, and reduced maintenance events have
allowed re-direction of personnel to other support requirements.
- treatment of undiluted deposition proccss
effluent gases results in hazardous waste reduction, consequently
reducing operating costs.
- personnel exposure to hazardous and/or toxic wastes is
reduced.
- Return On Investment, Statement During
Interview:
- relative to equipment related considerations, configured with a dry
pump, ROI was achieved within an acceptable period of time, even with
the required 15 day electrode replacement schedule for this nitride
application.
- ROI is achieved very quickly, relative to
increased productivity in 20 hour days, 7 days a week operation.
|
|
|
|
