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The New DryScrub® 2DH System
DryScrub, Electrochemical Technology
Corporation (ETC) are proud to present the addition of the Model 2DH to the
DryScrub® The newly developed DryScrub® 2DH is a more compact system which is big on performance. The new design offers many breakthroughs including, a new design of Electrode (patents pending), larger pressure operating range (as low as 37 mTorr or 5 Pa) and a space saving Chamber - only 290mm (11.4") dia.. This system offers High Performance with a large waste collection capacity, and as the electrode can be cleaned in-situ using an etch clean cycle, maintenance of the DryScrub® system can be virtually eliminated. The combination of the new Chamber, Electrode and RF Power Supply offer a new era in wafer particle reduction, exhaust gas treatment, downstream equipment protection, health, safety and environmental protection. Use
of the DryScrub® Systems gives many Process, Maintenance and Environmental
benefits. |
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© Copyright 2001 Electrochemical
Technology Corporation.
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Tel: +1-408-DryScrub |
(379-7278) |
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Toll Free: +1-888-DryScrub |
(379-7278) |
(Technical Information) |
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Fax +1-408-744-0446 |
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